Laser cleaning for PVD/CVD chamber shields, wafer fixtures, end effectors, and precision tooling in semiconductor manufacturing. Zero particulate generation, no media, and full ISO cleanroom compatibility with minimal disassembly and downtime.
Common Semiconductor & Cleanroom Materials
Stainless steel, aluminum, titanium, Inconel, nickel, and chrome-plated surfaces used in wafer handling fixtures, chamber shields, and process tooling — cleaned without introducing particles or altering critical surface finishes.
Common Contaminants in Semiconductor Tooling
Deposition residues, oxides, photoresist remnants, metallic particles, and process films that must be removed without generating new particles or damaging ultra-smooth surfaces.