Skip to main content

Laser Source Architectures

Select an architecture to browse manufacturers that use it, or learn how each source type affects fluence control, peak power, and process window.

Laser cleaning systems use four distinct source architectures, each with different implications for fluence control, peak power, and process window width. Selecting the right architecture for a cleaning application depends on the contamination type, substrate sensitivity, required throughput, and whether the work is done in a fixed facility or on-site.

Q-switched nanosecond (standard and high-energy) lasers are the workhorses of industrial laser cleaning. Pulse widths of 50–200 ns and repetition rates of 1–100 kHz provide a wide operating envelope for rust, paint, and oxide removal on metal substrates. High-energy Q-switched variants (≥10 mJ per pulse) can address thick contamination layers and mineral scale. Standard Q-switched systems (1–5 mJ) offer finer control for substrate-sensitive applications.

MOPA (Master Oscillator Power Amplifier) fiber lasers add independent control of pulse width, repetition rate, and peak power — parameters that are coupled in Q-switched designs. This programmability makes MOPA systems well-suited for applications requiring narrow process windows: colored metal cleaning, selective coating removal, and contamination removal from thermally sensitive alloys. MOPA systems typically offer pulse widths from 2 ns to several hundred ns at repetition rates up to 4 MHz.

CW (continuous wave) fiber lasers are used for high-throughput applications where process selectivity is less critical — heavy rust and mill scale removal on structural steel, for example. CW systems lack the peak power of pulsed architectures, which limits their effectiveness on hard mineral contamination and precise coating removal. They are typically lower cost and mechanically simpler.