Uranium-oxide contamination forms during exposure to oxidizing environments. Layer builds up on uranium surfaces and creates uneven patterns because of varying oxygen access. In observations, contamination exhibits patchy distribution so removal requires targeted laser application.
After formation, material shows altered reflectivity and adhesion properties. Laser cleaning addresses this by ablating oxide layers yet faces challenges from heat buildup, which can cause substrate damage. So, controlled pulses prevent re-contamination during process.
Surface behaves differently under irradiation; oxide resists initial vaporization because of its stable structure. Treatment achieves cleaner results on affected areas and restores uniformity. Results indicate that intermittent exposure minimizes risks in cleaning operations.
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